Details
Temperature Measurement during Millisecond Annealing
Ripple Pyrometry for Flash Lamp AnnealersMatWerk
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53,49 € |
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| Verlag: | Springer |
| Format: | |
| Veröffentl.: | 07.01.2016 |
| ISBN/EAN: | 9783658113889 |
| Sprache: | englisch |
Dieses eBook enthält ein Wasserzeichen.
Beschreibungen
<p>Denise Reichel studies the delicate subject of temperature measurement during lamp-based annealing of semiconductors, in particular during flash lamp annealing. The approach of background-correction using amplitude-modulated light to obtain the sample reflectivity is reinvented from rapid thermal annealing to apply to millisecond annealing. The author presents a new method independent of the lamp operation to obtain this amplitude modulation and derives a formula to describe the process. Further, she investigates the variables of the formula in depth to validate the method’s suitability for background-corrected temperature measurement. The experimental results finally proof its power for elevated temperatures.</p>
Introduction and motivation.- Fundamentals of flash lamp annealing of shallow Boron-doped Silicon.- Fundamentals of surface temperature measurements during flash lamp annealing.- Concept of ripple pyrometry during flash lamp annealing.- Ripple pyrometry for flash lamp annealing.- Experiments – ripple pyrometry during flash lamp annealing.- Closing discussion and outlook.
<p><b>Dr. Denise Reichel</b> currently works in technical sales and consulting for temperature measurement needs and as a lecturer for thermodynamics and heat and mass transfer.</p>
<p>Denise Reichel studies the delicate subject of temperature measurement during lamp-based annealing of semiconductors, in particular during flash lamp annealing. The approach of background-correction using amplitude-modulated light to obtain the sample reflectivity is reinvented from rapid thermal annealing to apply to millisecond annealing. The author presents a new method independent of the lamp operation to obtain this amplitude modulation and derives a formula to describe the process. Further, she investigates the variables of the formula in depth to validate the method’s suitability for background-corrected temperature measurement. The experimental results finally proof its power for elevated temperatures.</p><b>Contents</b> <p></p><ul><li>Fundamentals of flash lamp annealing of shallow Boron-doped Silicon<br></li><li>Fundamentals of surface temperature measurements during flash lamp annealing<br></li><li>Concept of ripple pyrometry during flash lamp annealing <br></li><li>Ripple pyrometry for flash lamp annealing – Experiments<br></li></ul><p></p><p></p> <p></p> <p><b>Target Groups</b></p><p>·Researchers and students from the fields of materials sciences and physics</p><p></p><p> </p><p>·Practitioners from microelectronics and photovoltaics industry</p><p></p> <p></p><b>About the Author</b> <p><b>Dr. Denise Reich</b>el currently works in technical sales and consulting for temperature</p> measurement needs and as a lecturer for thermodynamics and heat and mass transfer.<p></p><p></p><p></p> <p></p> <p></p>
Publication in the field of natural sciences Includes supplementary material: sn.pub/extras
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